Thickness Gauge Measurement With Conductive Wafers and Thin Films
Using MTI’s capacitive thickness gauge Proforma 300i with conductive wafers and thin films
G = (a+b+t1+t2 ) Where G is the fixed gap between two probes
When making the thickness measurement t2 can appear as t2 (film thickness) when it is a conductor, or 0 thickness when t2 is just air. So t2 will vary between the actual film thickness t2 if it’s a conductor all the way down to 0 thickness if the film has a dielectric constant of 1 (same as air). Some aero gel films have dielectric constants close to 1.
Apparent thickness of t2 to the system = t2 (1-*1/k) where k is the dielectric constant of the system
|Film Medium||Dielectric k||t2 Apparent Thickness|
|Metal or Si||Infinity||= t2|
Example Use Case Scenarios with various dielectric constants:
Assuming ProForma 300i is calibrated with a 1 mm Si wafer with no film:
- If we were to insert a 1 mm wafer with a 10 um film that had a dielectric constant of 2 then the wafer would measure as 1.005 mm thick.
- If we inserted a 1 mm wafer with a 10 um film that had a dielectric constant of 5 then the PF300i would read 1.008 mm thick.